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One of the most advanced surface treatment methods at present—PVD technology

Views:5     Author:Site Editor     Publish Time: 2021-07-08      Origin:Site

In the past ten years, the development of vacuum ion plating technology is the fastest, and it has become one of the most advanced surface treatment methods in contemporary times.

PVD (Physical Vapor Deposition) means "physical vapor deposition" in Chinese. It refers to a thin film preparation technology that uses a physical method to deposit materials on the workpiece to be plated under vacuum conditions. PVD technology is mainly divided into three categories: vacuum evaporation coating, vacuum sputtering coating and vacuum ion coating.

The similarity between PVD coating and traditional electroless plating is that both belong to the category of surface treatment, and both cover the surface of one material on the other material in a certain way. The difference between the two is: PVD coating has greater bonding force with the surface of the workpiece, the hardness of the coating is higher, wear resistance and corrosion resistance are better, and the performance of the coating is more stable; PVD coating can be plated The types of coatings are more extensive, and the colors of the coatings that can be plated are more and more beautiful; PVD coating will not produce toxic or polluting substances.

However, at this stage, PVD coating cannot replace chemical electroplating. In addition to the direct PVD coating on the surface of stainless steel materials, it is necessary to apply PVD coating on workpieces of many other materials (such as zinc alloy, copper, iron, etc.). They need to be electrolessly plated with Cr (chromium).


PVD coating is mainly applied to some relatively high-end hardware products. For those hardware products with lower prices, it is usually only subjected to chemical plating instead of PVD coating.

Vacuum evaporation coating, vacuum sputtering coating, vacuum ion coating The comparison of the three coating methods is as follows:

Compare items

Vacuum evaporation coating

Vacuum sputtering coating

Vacuum ion plating

Pressure (×133Pa)

10E-5~10E-6

0.15~0.02

0.02~0.005

Particle energy

neutral

0.1~1eV

1~10eV

0.1~1eV

ion

Hundreds to thousands

Precipitation rate (μm/min)

0.1~70

0.01~0.5

0.1~50

Diffraction

difference

better

it is good

Adhesion

not too good

better

well

Film compactness

Low density

high density

high density

Pores in the film

More at low temperature

less

less

Internal stress

Tensile stress

Compressive stress

Compressive stress


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